Micron
Boise / Global
Intern: AI-Driven OPC/RET for Advanced Mask Tech
- $25.000 - $39.000
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Boise / Global
Micron Technology invites you to join the Advanced Mask Development Group for an internship focused on Optical Proximity Correction and Resolution Enhancement Techniques. Study lithography modeling, build AI workflows for RET/OPC tasks, and collaborate with the Photolithography group to automate the RET development flow.
Pursuing BS, MS, or PhD in Engineering or Science with graduation not before Sept 1, 2027; strong analytical skills and multi-tasking abilities are required.
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Boise / Global
Boise / Global
Boise / Global
Boise / Global
Boise / Global
Boise / Global